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Computational methods for the simulation of the excimer laser annealing in MOS technology
Computational methods for the simulation of the excimer laser annealing in MOS technology
Computational methods for the simulation of the excimer laser annealing in MOS technology
Magna, A. L. (author) / Alippi, P. (author) / Mannino, G. (author) / Privitera, V. (author) / Fortunato, G. (author) / Mariucci, L. (author) / Camalleri, M. (author) / Monakhov, E. (author) / Svensson, B. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 114/115 ; 100-104
2004-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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