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Influence of the sputtering reactive gas on the oxide and oxynitride La?Ti?O?N deposition by RF magnetron sputtering
Influence of the sputtering reactive gas on the oxide and oxynitride La?Ti?O?N deposition by RF magnetron sputtering
Influence of the sputtering reactive gas on the oxide and oxynitride La?Ti?O?N deposition by RF magnetron sputtering
Lu, Y. (author) / Le Paven-Thivet, C. (author) / Benzerga, R. (author) / Le Gendre, L. (author) / Sharaiha, A. (author) / Tessier, F. (author) / Chevire, F. (author)
APPLIED SURFACE SCIENCE ; 264 ; 533-537
2013-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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