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    Thermal and electrical stability of TaN x diffusion barriers for Cu metallization

    New search for: Dalili, N.
    New search for: Liu, Q.
    New search for: Ivey, D. G.

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    Thermal and electrical stability of TaN x diffusion barriers for Cu metallization

    New search for: Dalili, N.
    New search for: Liu, Q.
    New search for: Ivey, D. G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Thermal and electrical stability of TaN x diffusion barriers for Cu metallization

    New search for: Dalili, N.
    New search for: Liu, Q.
    New search for: Ivey, D. G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Thermal and electrical stability of TaN x diffusion barriers for Cu metallization

    Contributors:

    Dalili, N. (author) / Liu, Q. (author) / Ivey, D. G. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 48 ; 489-501

    Publication date:

    2013-01-01

    Size:

    13 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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