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The study of the substrate temperature depended growth properties of microcrystalline silicon films deposited by VHF-PECVD method
The study of the substrate temperature depended growth properties of microcrystalline silicon films deposited by VHF-PECVD method
The study of the substrate temperature depended growth properties of microcrystalline silicon films deposited by VHF-PECVD method
Chen, Y. (Autor:in) / Chen, X. (Autor:in) / Hao, X. (Autor:in) / Lu, J. (Autor:in) / Yang, S. e. (Autor:in)
APPLIED SURFACE SCIENCE ; 270 ; 737-740
01.01.2013
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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