Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition

    New search for: Zhang, J.
    New search for: Yang, H.
    New search for: Zhang, Q. l.
    New search for: Dong, S.
    New search for: Luo, J. K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition

    New search for: Zhang, J.
    New search for: Yang, H.
    New search for: Zhang, Q. l.
    New search for: Dong, S.
    New search for: Luo, J. K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition

    New search for: Zhang, J.
    New search for: Yang, H.
    New search for: Zhang, Q. l.
    New search for: Dong, S.
    New search for: Luo, J. K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition

    Contributors:

    Zhang, J. (author) / Yang, H. (author) / Zhang, Q. l. (author) / Dong, S. (author) / Luo, J. K. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 282 ; 390-395

    Publication date:

    2013-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition

    Zhang, Jian / Zhang, Qilong / Yang, Hui et al. | British Library Online Contents | 2014

    Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition

    Zhang, J. / Zhang, Q. / Yang, H. et al. | British Library Online Contents | 2014

    Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition

    Chesnokov, Y. M. / Miakonkikh, A. V. / Rogozhin, A. E. et al. | British Library Online Contents | 2018

    XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition

    Motamedi, P. / Cadien, K. | British Library Online Contents | 2014

    XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition

    Motamedi, P. / Cadien, K. | British Library Online Contents | 2014

    Back to top