Controlled growth and properties of p-type cuprous oxide films by plasma-enhanced atomic layer deposition at low temperature: Fid-Bau Portal

Controlled growth and properties of p-type cuprous oxide films by plasma-enhanced atomic layer deposition at low temperature

Kwon, J. D. / Kwon, S. H. / Jung, T. H. / Nam, K. S. / Chung, K. B. / Kim, D. H. / Park, J. S.

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Controlled growth and properties of p-type cuprous oxide films by plasma-enhanced atomic layer deposition at low temperature

Kwon, J. D. / Kwon, S. H. / Jung, T. H. / Nam, K. S. / Chung, K. B. / Kim, D. H. / Park, J. S.

Controlled growth and properties of p-type cuprous oxide films by plasma-enhanced atomic layer deposition at low temperature

Kwon, J. D. / Kwon, S. H. / Jung, T. H. / Nam, K. S. / Chung, K. B. / Kim, D. H. / Park, J. S.

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Document information

Title:

Controlled growth and properties of p-type cuprous oxide films by plasma-enhanced atomic layer deposition at low temperature

Contributors:

Kwon, J. D. (author) / Kwon, S. H. (author) / Jung, T. H. (author) / Nam, K. S. (author) / Chung, K. B. (author) / Kim, D. H. (author) / Park, J. S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 285 ; 373-379

Publication date:

2013-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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