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Graphene masks as passivation layers in the electrochemical etching of silicon
Graphene masks as passivation layers in the electrochemical etching of silicon
Graphene masks as passivation layers in the electrochemical etching of silicon
Fang, C. (author) / Shapter, J. G. (author) / Voelcker, N. H. (author) / Ellis, A. V. (author)
JOURNAL OF MATERIALS SCIENCE ; 49 ; 7819-7823
2014-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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