TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation: Fid-Bau Portal

TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation

Wang, H. / Li, Y. / Ba, X. / Huang, L. / Yu, Y.

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TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation

Wang, H. / Li, Y. / Ba, X. / Huang, L. / Yu, Y.

TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation

Wang, H. / Li, Y. / Ba, X. / Huang, L. / Yu, Y.

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Order at Subito €

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Document information

Title:

TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation

Contributors:

Wang, H. (author) / Li, Y. (author) / Ba, X. (author) / Huang, L. (author) / Yu, Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 345 ; 49-56

Publication date:

2015-01-01

Size:

8 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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