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    Effects of temperature and pressure in oxynitridation kinetics on Si(100) with N2O gas

    New search for: Enta, Yoshiharu
    New search for: Wada, Makoto
    New search for: Arita, Mariko
    New search for: Takami, Takahiro

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    Effects of temperature and pressure in oxynitridation kinetics on Si(100) with N2O gas

    New search for: Enta, Yoshiharu
    New search for: Wada, Makoto
    New search for: Arita, Mariko
    New search for: Takami, Takahiro

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effects of temperature and pressure in oxynitridation kinetics on Si(100) with N2O gas

    New search for: Enta, Yoshiharu
    New search for: Wada, Makoto
    New search for: Arita, Mariko
    New search for: Takami, Takahiro

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Effects of temperature and pressure in oxynitridation kinetics on Si(100) with N2O gas

    Contributors:

    Enta, Yoshiharu (author) / Wada, Makoto (author) / Arita, Mariko (author) / Takami, Takahiro (author)

    Published in:

    Materials science in semiconductor processing ; 70 ; 63-67

    Publication date:

    2017-01-01

    Size:

    5 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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