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Properties of AlN grown by plasma enhanced atomic layer deposition
Properties of AlN grown by plasma enhanced atomic layer deposition
Properties of AlN grown by plasma enhanced atomic layer deposition
Bosund, M. (author) / Sajavaara, T. (author) / Laitinen, M. (author) / Huhtio, T. (author) / Putkonen, M. (author) / Airaksinen, V. M. (author) / Lipsanen, H. (author)
APPLIED SURFACE SCIENCE ; 257 ; 7827-7830
2011-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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