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    Properties of AlN grown by plasma enhanced atomic layer deposition

    New search for: Bosund, M.
    New search for: Sajavaara, T.
    New search for: Laitinen, M.
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    New search for: Airaksinen, V. M.
    New search for: Lipsanen, H.

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    Properties of AlN grown by plasma enhanced atomic layer deposition

    New search for: Bosund, M.
    New search for: Sajavaara, T.
    New search for: Laitinen, M.
    New search for: Huhtio, T.
    New search for: Putkonen, M.
    New search for: Airaksinen, V. M.
    New search for: Lipsanen, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Properties of AlN grown by plasma enhanced atomic layer deposition

    New search for: Bosund, M.
    New search for: Sajavaara, T.
    New search for: Laitinen, M.
    New search for: Huhtio, T.
    New search for: Putkonen, M.
    New search for: Airaksinen, V. M.
    New search for: Lipsanen, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Properties of AlN grown by plasma enhanced atomic layer deposition

    Contributors:

    Bosund, M. (author) / Sajavaara, T. (author) / Laitinen, M. (author) / Huhtio, T. (author) / Putkonen, M. (author) / Airaksinen, V. M. (author) / Lipsanen, H. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 7827-7830

    Publication date:

    2011-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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