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Low-temperature amorphous boron nitride on Si0.7Ge0.3(001), Cu, and HOPG from sequential exposures of N2H4 and BCl3
Low-temperature amorphous boron nitride on Si0.7Ge0.3(001), Cu, and HOPG from sequential exposures of N2H4 and BCl3
Low-temperature amorphous boron nitride on Si0.7Ge0.3(001), Cu, and HOPG from sequential exposures of N2H4 and BCl3
Wolf, Steven (author) / Edmonds, Mary (author) / Sardashti, Kasra (author) / Clemons, Max (author) / Park, Jun Hong (author) / Yoshida, Naomi (author) / Dong, Lin (author) / Nemani, Srinivas (author) / Yieh, Ellie (author) / Holmes, Russell (author)
Applied surface science ; 439 ; 689-696
2018-01-01
8 pages
Article (Journal)
English
DDC:
620.44
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