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Al2O3/Si0.7Ge0.3(001) & HfO2/Si0.7Ge0.3(001) interface trap state reduction via in-situ N2/H2 RF downstream plasma passivation
Al2O3/Si0.7Ge0.3(001) & HfO2/Si0.7Ge0.3(001) interface trap state reduction via in-situ N2/H2 RF downstream plasma passivation
Al2O3/Si0.7Ge0.3(001) & HfO2/Si0.7Ge0.3(001) interface trap state reduction via in-situ N2/H2 RF downstream plasma passivation
Breeden, Michael (author) / Wolf, Steven (author) / Ueda, Scott (author) / Fang, Ziwei (author) / Chang, Chih-Yu (author) / Tang, Kechao (author) / McIntyre, Paul (author) / Kummel, Andrew C. (author)
Applied surface science ; 478 ; 1065-1073
2019-01-01
9 pages
Article (Journal)
English
DDC:
620.44
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