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Characterization of ultra shallow p+-n junctions formed by a modified low-energy ion implanter and rapid thermal annealing
Characterization of ultra shallow p+-n junctions formed by a modified low-energy ion implanter and rapid thermal annealing
Characterization of ultra shallow p+-n junctions formed by a modified low-energy ion implanter and rapid thermal annealing
Hong, Shin Nam (author)
1990
MFiche
Raleigh, North Carolina State Univ., PH.D.Thesis 1989
Digital preservation by Technische Informationsbibliothek (TIB) / Leibniz-Informationszentrum Technik und Naturwissenschaften und Universitätsbibliothek
Book
Unknown
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