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Fabrication of ultra-shallow junctions with high electrical activation by excimer laser annealing

Fortunato, G. / Mariucci, L. / Stanizzi, M. / Privitera, V. / Spinella, C. / Coffa, S. / Napolitani, E.

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Fabrication of ultra-shallow junctions with high electrical activation by excimer laser annealing

Fortunato, G. / Mariucci, L. / Stanizzi, M. / Privitera, V. / Spinella, C. / Coffa, S. / Napolitani, E.

Fabrication of ultra-shallow junctions with high electrical activation by excimer laser annealing

Fortunato, G. / Mariucci, L. / Stanizzi, M. / Privitera, V. / Spinella, C. / Coffa, S. / Napolitani, E.

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Document information

Title:

Fabrication of ultra-shallow junctions with high electrical activation by excimer laser annealing

Contributors:

Fortunato, G. (author) / Mariucci, L. (author) / Stanizzi, M. (author) / Privitera, V. (author) / Spinella, C. (author) / Coffa, S. (author) / Napolitani, E. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 4 ; 417-423

Publication date:

2001-01-01

Size:

7 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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