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Oxide sintered body and sputtering target
An oxide sintered body which is obtained by mixing and sintering zinc oxide, indium oxide, gallium oxide and tin oxide. The relative density of the oxide sintered body is 85% or more and X-ray diffraction of the oxide sintered body shows that a Zn2SnO4 phase and an InGaZnO4 phase are contained in a prescribed proportion.
Oxide sintered body and sputtering target
An oxide sintered body which is obtained by mixing and sintering zinc oxide, indium oxide, gallium oxide and tin oxide. The relative density of the oxide sintered body is 85% or more and X-ray diffraction of the oxide sintered body shows that a Zn2SnO4 phase and an InGaZnO4 phase are contained in a prescribed proportion.
Oxide sintered body and sputtering target
TAO YUKI (author) / KANAMARU MORIYOSHI (author) / NAMBU AKIRA (author) / HATA HIDEO (author)
2015-05-13
Patent
Electronic Resource
English
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