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Composite Oxide Sintered Body And Sputtering Target Comprising Same
A composite oxide sintered body includes In, Zn, and Sn, and has a relative density of 90% or more, an average crystal grain size of 10 [mu]m or less, and a bulk resistance of 30 m[Omega]cm or less, the number of tin oxide aggregate particles having a diameter of 10 [mu]m or more being 2.5 or less per mm2 of the composite oxide sintered body.
Composite Oxide Sintered Body And Sputtering Target Comprising Same
A composite oxide sintered body includes In, Zn, and Sn, and has a relative density of 90% or more, an average crystal grain size of 10 [mu]m or less, and a bulk resistance of 30 m[Omega]cm or less, the number of tin oxide aggregate particles having a diameter of 10 [mu]m or more being 2.5 or less per mm2 of the composite oxide sintered body.
Composite Oxide Sintered Body And Sputtering Target Comprising Same
KOKI YANO (author) / HIROKAZU KAWASHIMA (author)
2015-09-23
Patent
Electronic Resource
English
IPC:
C04B
Kalk
,
LIME
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