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Handle substrate of composite substrate for semiconductor
The alumina purity of the transparent polycrystalline alumina constituting the handle substrate is 99.9% or more, and the porosity of the transparent polycrystalline alumina is 0.01-0.1%. The number of pores having a size of 0.5 [mu]m or more contained in the surface region of the joining face side of the handle substrate is 0.5 or less than the number of pores having a size of 0.1-0.3 [mu]m contained in the surface region.
Handle substrate of composite substrate for semiconductor
The alumina purity of the transparent polycrystalline alumina constituting the handle substrate is 99.9% or more, and the porosity of the transparent polycrystalline alumina is 0.01-0.1%. The number of pores having a size of 0.5 [mu]m or more contained in the surface region of the joining face side of the handle substrate is 0.5 or less than the number of pores having a size of 0.1-0.3 [mu]m contained in the surface region.
Handle substrate of composite substrate for semiconductor
MIYAZAWA SUGIO (author) / IWASAKI YASUNORI (author) / TAKAGAKI TATSURO (author) / IDE AKIYOSHI (author) / NAKANISHI HIROKAZU (author)
2015-12-23
Patent
Electronic Resource
English
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