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BNT target material for magnetron sputtering and method for preparing BNT target material by utilizing hot pressing method
The invention relates to a BNT target material for magnetron sputtering and a method for preparing the BNT target material by using a hot pressing method, the molecular formula of the target material is Bi (0.45-0.55) Na (0.45-0.55) TiO3, Bi2O3, Na2CO3 and TiO2 are used as raw materials, and the molar mass ratio of the raw materials is as follows: Bi2O3: Na2CO3: TiO2 = (104.841-128.139): (23.847-29.147): 79.87; according to the method for preparing the BNT target material for magnetron sputtering by utilizing the hot pressing method, certain pressure is applied in the sintering process, and the mass transfer processes of contact, diffusion, flowing and the like of powder particles are accelerated, so that the sintering temperature can be reduced, the component change of volatile components in the Bi0. 5Na0. 5TiO3 target material can be effectively controlled, the sintering time is shortened, the time cost for preparing the target material is saved, and the method is suitable for industrial production. The Bi0. 5Na0. 5TiO3 target material with low porosity and the density reaching 99% or above is easy to obtain; in addition, by means of a mold forming mechanism, the shrinkage rate of the target material prepared through HP is 0%, and accurate control over the size of the large-size target material is achieved. The preparation process is simple, and the prepared large-size sodium bismuth titanate ceramic target material is compact and free of cracking.
一种磁控溅射用BNT靶材及利用热压法制备BNT靶材的方法，其中，靶材分子式为Bi(0.45～0.55)Na(0.45～0.55)TiO3,以Bi2O3、Na2CO3和TiO2为原料，各原料的摩尔质量比为：Bi2O3:Na2CO3:TiO2＝(104.841～128.139):(23.847～29.147):79.87；利用热压法制备磁控溅射用BNT靶材的方法，通过在烧结过程中施加一定压力，加速粉末颗粒的接触、扩散和流动等传质过程，能够降低烧结温度，有效控制Bi0.5Na0.5TiO3靶材中易挥发成分的组分变化，同时缩短烧结时间，节省靶材制备的时间成本，易于获得气孔率低、致密度达99％以上的Bi0.5Na0.5TiO3靶材；另外，利用模具成型机制，HP制备靶材的收缩率为0％，实现了大尺寸靶材尺寸的精确控制；制备工艺简单，制备的大尺寸钛酸铋钠陶瓷靶材致密无开裂。
BNT target material for magnetron sputtering and method for preparing BNT target material by utilizing hot pressing method
The invention relates to a BNT target material for magnetron sputtering and a method for preparing the BNT target material by using a hot pressing method, the molecular formula of the target material is Bi (0.45-0.55) Na (0.45-0.55) TiO3, Bi2O3, Na2CO3 and TiO2 are used as raw materials, and the molar mass ratio of the raw materials is as follows: Bi2O3: Na2CO3: TiO2 = (104.841-128.139): (23.847-29.147): 79.87; according to the method for preparing the BNT target material for magnetron sputtering by utilizing the hot pressing method, certain pressure is applied in the sintering process, and the mass transfer processes of contact, diffusion, flowing and the like of powder particles are accelerated, so that the sintering temperature can be reduced, the component change of volatile components in the Bi0. 5Na0. 5TiO3 target material can be effectively controlled, the sintering time is shortened, the time cost for preparing the target material is saved, and the method is suitable for industrial production. The Bi0. 5Na0. 5TiO3 target material with low porosity and the density reaching 99% or above is easy to obtain; in addition, by means of a mold forming mechanism, the shrinkage rate of the target material prepared through HP is 0%, and accurate control over the size of the large-size target material is achieved. The preparation process is simple, and the prepared large-size sodium bismuth titanate ceramic target material is compact and free of cracking.
一种磁控溅射用BNT靶材及利用热压法制备BNT靶材的方法，其中，靶材分子式为Bi(0.45～0.55)Na(0.45～0.55)TiO3,以Bi2O3、Na2CO3和TiO2为原料，各原料的摩尔质量比为：Bi2O3:Na2CO3:TiO2＝(104.841～128.139):(23.847～29.147):79.87；利用热压法制备磁控溅射用BNT靶材的方法，通过在烧结过程中施加一定压力，加速粉末颗粒的接触、扩散和流动等传质过程，能够降低烧结温度，有效控制Bi0.5Na0.5TiO3靶材中易挥发成分的组分变化，同时缩短烧结时间，节省靶材制备的时间成本，易于获得气孔率低、致密度达99％以上的Bi0.5Na0.5TiO3靶材；另外，利用模具成型机制，HP制备靶材的收缩率为0％，实现了大尺寸靶材尺寸的精确控制；制备工艺简单，制备的大尺寸钛酸铋钠陶瓷靶材致密无开裂。
BNT target material for magnetron sputtering and method for preparing BNT target material by utilizing hot pressing method
一种磁控溅射用BNT靶材及利用热压法制备BNT靶材的方法
WU HAIJUN (author) / LIU ZIYU (author) / PENG GUYANG (author)
2024-03-22
Patent
Electronic Resource
Chinese
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