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A platform for research: civil engineering, architecture and urbanism
SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM, AND CONDUCTIVE FILM
PROBLEM TO BE SOLVED: To provide a transparent conductive oxide thin film with higher light transmittance and conductivity.SOLUTION: A sputtering target is predominantly composed of ZnO and GaO, where the content of GaOis 18-25 mol% relative to the total amounts of GaOand ZnO. The sputtering target has a structure in which particles predominantly composed of GaOare dispersed in a matrix predominantly composed of ZnO, where the particles predominantly composed of GaOhave an average particle diameter of 1.5 μm-10 μm.SELECTED DRAWING: Figure 1
【課題】より高い光線透過性及び導電性を有する透明導電性酸化物薄膜を提供すること。【解決手段】主成分としてのＺｎＯとＧａ２Ｏ３と含み、Ｇａ２Ｏ３の含有量は、Ｇａ２Ｏ３及びＺｎＯの合計量に対して１８〜２５モル％であり、ＺｎＯを主成分とするマトリクス中にＧａ２Ｏ３を主成分とする粒子が分散した構造を有し、前記Ｇａ２Ｏ３を主成分とする粒子の平均粒径が１．５μｍ〜１０μｍである、スパッタリングターゲット。【選択図】図１
SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM, AND CONDUCTIVE FILM
PROBLEM TO BE SOLVED: To provide a transparent conductive oxide thin film with higher light transmittance and conductivity.SOLUTION: A sputtering target is predominantly composed of ZnO and GaO, where the content of GaOis 18-25 mol% relative to the total amounts of GaOand ZnO. The sputtering target has a structure in which particles predominantly composed of GaOare dispersed in a matrix predominantly composed of ZnO, where the particles predominantly composed of GaOhave an average particle diameter of 1.5 μm-10 μm.SELECTED DRAWING: Figure 1
【課題】より高い光線透過性及び導電性を有する透明導電性酸化物薄膜を提供すること。【解決手段】主成分としてのＺｎＯとＧａ２Ｏ３と含み、Ｇａ２Ｏ３の含有量は、Ｇａ２Ｏ３及びＺｎＯの合計量に対して１８〜２５モル％であり、ＺｎＯを主成分とするマトリクス中にＧａ２Ｏ３を主成分とする粒子が分散した構造を有し、前記Ｇａ２Ｏ３を主成分とする粒子の平均粒径が１．５μｍ〜１０μｍである、スパッタリングターゲット。【選択図】図１
SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM, AND CONDUCTIVE FILM
スパッタリングターゲット、透明導電性酸化物薄膜、及び導電性フィルム
KIUCHI KENICHI (author) / KAWAGUCHI YUKIO (author) / IINO MINORU (author)
2016-03-10
Patent
Electronic Resource
Japanese
SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM, AND CONDUCTIVE FILM
| European Patent Office | 2016
SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM AND CONDUCTIVE FILM
| European Patent Office | 2016