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METHOD FOR PRODUCING VO2 SINTERED BODY AND VO2 SINTERED BODY SPUTTERING TARGET
To provide a method for producing a VO2 sintered body that can produce a sintered body with high relative density by using poor-sinterable VO2 base powder, and a VO2 sintered body sputtering target.SOLUTION: A method for producing a VO2 sintered body includes a process in which V2O5 powder and V2O3 powder are mixed to prepare mixture powder; in a nonoxidative atmosphere the mixture powder is compressed while heated, causing the sintering reaction between the V2O5 and V2O3 powder, resulting in a sintered body with a relative density of 95% or more. There is also provided a VO2 sintered body sputtering target with a VO2 sintered body having a relative density of 95% or more.SELECTED DRAWING: None
【課題】本発明は、難焼結性のＶＯ2原料粉末を用いて、相対密度の高い焼結体を生成しうるＶＯ2焼結体の製造方法、および、ＶＯ2焼結体スパッタリングターゲットを提供することを目的とする。【解決手段】Ｖ2Ｏ5粉とＶ2Ｏ3粉とを混合して混合粉を調製し、非酸化雰囲気下に、前記混合粉を加熱しながら圧縮して、Ｖ2Ｏ5粉とＶ2Ｏ3粉との反応焼結を行うことにより、相対密度が９５％以上の焼結体を作製する、ＶＯ2焼結体の製造方法、および、ＶＯ2焼結体の相対密度が９５％以上である、ＶＯ2焼結体スパッタリングターゲット。【選択図】なし
METHOD FOR PRODUCING VO2 SINTERED BODY AND VO2 SINTERED BODY SPUTTERING TARGET
To provide a method for producing a VO2 sintered body that can produce a sintered body with high relative density by using poor-sinterable VO2 base powder, and a VO2 sintered body sputtering target.SOLUTION: A method for producing a VO2 sintered body includes a process in which V2O5 powder and V2O3 powder are mixed to prepare mixture powder; in a nonoxidative atmosphere the mixture powder is compressed while heated, causing the sintering reaction between the V2O5 and V2O3 powder, resulting in a sintered body with a relative density of 95% or more. There is also provided a VO2 sintered body sputtering target with a VO2 sintered body having a relative density of 95% or more.SELECTED DRAWING: None
【課題】本発明は、難焼結性のＶＯ2原料粉末を用いて、相対密度の高い焼結体を生成しうるＶＯ2焼結体の製造方法、および、ＶＯ2焼結体スパッタリングターゲットを提供することを目的とする。【解決手段】Ｖ2Ｏ5粉とＶ2Ｏ3粉とを混合して混合粉を調製し、非酸化雰囲気下に、前記混合粉を加熱しながら圧縮して、Ｖ2Ｏ5粉とＶ2Ｏ3粉との反応焼結を行うことにより、相対密度が９５％以上の焼結体を作製する、ＶＯ2焼結体の製造方法、および、ＶＯ2焼結体の相対密度が９５％以上である、ＶＯ2焼結体スパッタリングターゲット。【選択図】なし
METHOD FOR PRODUCING VO2 SINTERED BODY AND VO2 SINTERED BODY SPUTTERING TARGET
ＶＯ２焼結体の製造方法およびＶＯ２焼結体スパッタリングターゲット
AKIBA YUKI (author) / UNNO TAKAHIRO (author) / SHIBAKI KENJI (author) / TOGASHI NAOTO (author) / YOSHIZAWA KANTARO (author) / SHIBAYAMA TAKASANE (author)
2021-05-06
Patent
Electronic Resource
Japanese
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