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SPUTTERING TARGET MEMBER AND METHOD FOR PRODUCING SPUTTERING TARGET MEMBER
To provide a sputtering target member having improved thermal shock resistance.SOLUTION: A sputtering target member includes In, Sn, Zn, and O. Measured by X-ray diffraction analysis, the peak intensities of Zn2SnO4 phase, Zn4In2O7 phase, In2O3 phase, and ZnO phase are defined as I(Zn2SnO4), I(Zn4In2O7), I(In2O3), and I(ZnO), where the following relational expressions (1)-(4) hold: I(Zn2SnO4)/(I(Zn2SnO4)+I(Zn4In2O7)+I(In2O3)+I(ZnO))×100≥3.0 (1), I(Zn4In2O7)/I(Zn2SnO4)×100≥1.0 (2), I(In2O3)/I(Zn2SnO4)×100≥1.0 (3), and I(ZnO)/I(Zn2SnO4)×100≤1.0 (4).SELECTED DRAWING: Figure 1
【課題】耐熱衝撃性の改善されたスパッタリングターゲット部材を提供すること。【解決手段】Ｉｎ、Ｓｎ、Ｚｎ、及びＯを含み、Ｘ線回折分析により測定されるＺｎ2ＳｎＯ4相、Ｚｎ4Ｉｎ2Ｏ7相、Ｉｎ2Ｏ3相、及びＺｎＯ相のピーク強度をそれぞれ、Ｉ（Ｚｎ2ＳｎＯ4）、Ｉ（Ｚｎ4Ｉｎ2Ｏ7）、Ｉ（Ｉｎ2Ｏ3）、及びＩ（ＺｎＯ）とした時、下記（１）～（４）の関係式を満たすスパッタリングターゲット部材。Ｉ（Ｚｎ2ＳｎＯ4）／（Ｉ（Ｚｎ2ＳｎＯ4）＋Ｉ（Ｚｎ4Ｉｎ2Ｏ7）＋Ｉ（Ｉｎ2Ｏ3）＋Ｉ（ＺｎＯ））×１００≧３．０ ・・・（１）Ｉ（Ｚｎ4Ｉｎ2Ｏ7）／Ｉ（Ｚｎ2ＳｎＯ4）×１００≧１．０ ・・・（２）Ｉ（Ｉｎ2Ｏ3）／Ｉ（Ｚｎ2ＳｎＯ4）×１００≧１．０ ・・・（３）Ｉ（ＺｎＯ）／Ｉ（Ｚｎ2ＳｎＯ4）×１００≦１．０ ・・・（４）【選択図】図１
SPUTTERING TARGET MEMBER AND METHOD FOR PRODUCING SPUTTERING TARGET MEMBER
To provide a sputtering target member having improved thermal shock resistance.SOLUTION: A sputtering target member includes In, Sn, Zn, and O. Measured by X-ray diffraction analysis, the peak intensities of Zn2SnO4 phase, Zn4In2O7 phase, In2O3 phase, and ZnO phase are defined as I(Zn2SnO4), I(Zn4In2O7), I(In2O3), and I(ZnO), where the following relational expressions (1)-(4) hold: I(Zn2SnO4)/(I(Zn2SnO4)+I(Zn4In2O7)+I(In2O3)+I(ZnO))×100≥3.0 (1), I(Zn4In2O7)/I(Zn2SnO4)×100≥1.0 (2), I(In2O3)/I(Zn2SnO4)×100≥1.0 (3), and I(ZnO)/I(Zn2SnO4)×100≤1.0 (4).SELECTED DRAWING: Figure 1
【課題】耐熱衝撃性の改善されたスパッタリングターゲット部材を提供すること。【解決手段】Ｉｎ、Ｓｎ、Ｚｎ、及びＯを含み、Ｘ線回折分析により測定されるＺｎ2ＳｎＯ4相、Ｚｎ4Ｉｎ2Ｏ7相、Ｉｎ2Ｏ3相、及びＺｎＯ相のピーク強度をそれぞれ、Ｉ（Ｚｎ2ＳｎＯ4）、Ｉ（Ｚｎ4Ｉｎ2Ｏ7）、Ｉ（Ｉｎ2Ｏ3）、及びＩ（ＺｎＯ）とした時、下記（１）～（４）の関係式を満たすスパッタリングターゲット部材。Ｉ（Ｚｎ2ＳｎＯ4）／（Ｉ（Ｚｎ2ＳｎＯ4）＋Ｉ（Ｚｎ4Ｉｎ2Ｏ7）＋Ｉ（Ｉｎ2Ｏ3）＋Ｉ（ＺｎＯ））×１００≧３．０ ・・・（１）Ｉ（Ｚｎ4Ｉｎ2Ｏ7）／Ｉ（Ｚｎ2ＳｎＯ4）×１００≧１．０ ・・・（２）Ｉ（Ｉｎ2Ｏ3）／Ｉ（Ｚｎ2ＳｎＯ4）×１００≧１．０ ・・・（３）Ｉ（ＺｎＯ）／Ｉ（Ｚｎ2ＳｎＯ4）×１００≦１．０ ・・・（４）【選択図】図１
SPUTTERING TARGET MEMBER AND METHOD FOR PRODUCING SPUTTERING TARGET MEMBER
スパッタリングターゲット部材及びスパッタリングターゲット部材の製造方法
MIZUFUJI KOSUKE (author) / NARA ATSUSHI (author)
2023-09-06
Patent
Electronic Resource
Japanese
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