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SPUTTERING TARGET AND OXIDE SEMICONDUCTOR FILM
인듐(In), 갈륨(Ga) 및 아연(Zn)의 산화물을 함유하는 스퍼터링 타겟으로서, ZnGaO로 표시되는 화합물 및 InGaZn로 표시되는 화합물을 포함하는 스퍼터링 타겟.
A sputtering target containing oxides of indium (In), gallium (Ga) and zinc (Zn), which includes a compound shown by ZnGa 2 O 4 and a compound shown by InGaZnO 4 .
SPUTTERING TARGET AND OXIDE SEMICONDUCTOR FILM
인듐(In), 갈륨(Ga) 및 아연(Zn)의 산화물을 함유하는 스퍼터링 타겟으로서, ZnGaO로 표시되는 화합물 및 InGaZn로 표시되는 화합물을 포함하는 스퍼터링 타겟.
A sputtering target containing oxides of indium (In), gallium (Ga) and zinc (Zn), which includes a compound shown by ZnGa 2 O 4 and a compound shown by InGaZnO 4 .
SPUTTERING TARGET AND OXIDE SEMICONDUCTOR FILM
스퍼터링 타겟 및 산화물 반도체막
2017-01-26
Patent
Electronic Resource
Korean
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