A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
An oxide sintered body (1) in which the average value of the Vickers Hardness values of the surface of the oxide sintered body (1) is 500 to 900 Hv exclusive.
L'invention concerne un corps fritté à base d'oxyde (1) dans lequel la valeur moyenne des valeurs de dureté Vickers de la surface du corps fritté à base d'oxyde (1) est comprise entre 500 et 900 Hv non inclus.
酸化物焼結体（１）であって、酸化物焼結体（１）の表面のビッカース硬度の平均値が、５００Ｈｖを超え、９００Ｈｖ未満である、酸化物焼結体（１）。
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
An oxide sintered body (1) in which the average value of the Vickers Hardness values of the surface of the oxide sintered body (1) is 500 to 900 Hv exclusive.
L'invention concerne un corps fritté à base d'oxyde (1) dans lequel la valeur moyenne des valeurs de dureté Vickers de la surface du corps fritté à base d'oxyde (1) est comprise entre 500 et 900 Hv non inclus.
酸化物焼結体（１）であって、酸化物焼結体（１）の表面のビッカース硬度の平均値が、５００Ｈｖを超え、９００Ｈｖ未満である、酸化物焼結体（１）。
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
CORPS FRITTÉ À BASE D'OXYDE, CIBLE DE PULVÉRISATION ET PROCÉDÉ DE PRODUCTION D'UNE CIBLE DE PULVÉRISATION
酸化物焼結体、スパッタリングターゲット及びスパッタリングターゲットの製造方法
KAIJO AKIRA (author)
2020-08-27
Patent
Electronic Resource
Japanese
Oxide sintered body, sputtering target, and method for producing sputtering target
| European Patent Office | 2021
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
| European Patent Office | 2020
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
| European Patent Office | 2021