A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
An oxide sintered body which has a surface having surface roughness Rz of less than 2.0 μm.
La présente invention concerne un corps fritté à base d'oxyde qui a une surface ayant une rugosité de surface Rz inférieure à 2,0 µm.
酸化物焼結体であって、前記酸化物焼結体の表面の表面粗さＲｚが、２.０μｍ未満である、酸化物焼結体。
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
An oxide sintered body which has a surface having surface roughness Rz of less than 2.0 μm.
La présente invention concerne un corps fritté à base d'oxyde qui a une surface ayant une rugosité de surface Rz inférieure à 2,0 µm.
酸化物焼結体であって、前記酸化物焼結体の表面の表面粗さＲｚが、２.０μｍ未満である、酸化物焼結体。
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
CORPS FRITTÉ À BASE D'OXYDE, CIBLE DE PULVÉRISATION ET PROCÉDÉ DE PRODUCTION D'UNE CIBLE
酸化物焼結体、スパッタリングターゲット及びスパッタリングターゲットの製造方法
KAIJO AKIRA (author)
2020-08-27
Patent
Electronic Resource
Japanese
Oxide sintered body, sputtering target, and method for producing sputtering target
| European Patent Office | 2021
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
| European Patent Office | 2020
OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET
| European Patent Office | 2021