Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Oxide sintered body, sputtering target, and method for producing sputtering target

    New search for: KAIJO AKIRA

    The invention relates to an oxide sintered body which has a surface having surface roughness Rz of less than 2.0 [mu]m.

    本发明涉及一种氧化物烧结体，所述氧化物烧结体的表面的表面粗糙度Rz小于2.0μm。

    Access

    Download

    Access

    Download

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Oxide sintered body, sputtering target, and method for producing sputtering target

    New search for: KAIJO AKIRA

    The invention relates to an oxide sintered body which has a surface having surface roughness Rz of less than 2.0 [mu]m.

    本发明涉及一种氧化物烧结体，所述氧化物烧结体的表面的表面粗糙度Rz小于2.0μm。

    Access

    Download

    Oxide sintered body, sputtering target, and method for producing sputtering target

    New search for: KAIJO AKIRA

    The invention relates to an oxide sintered body which has a surface having surface roughness Rz of less than 2.0 [mu]m.

    本发明涉及一种氧化物烧结体，所述氧化物烧结体的表面的表面粗糙度Rz小于2.0μm。

    Access

    Download

    Access

    Download

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Oxide sintered body, sputtering target, and method for producing sputtering target

    Additional title:

    氧化物烧结体、溅射靶以及溅射靶的制造方法

    Contributors:

    KAIJO AKIRA (author)

    Publication date:

    2021-11-19

    Type of media:

    Patent

    Type of material:

    Electronic Resource

    Language:

    Chinese

    Classification:

    IPC:  C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL / B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING , Maschinen, Einrichtungen oder Verfahren zum Schleifen oder Polieren / C04B Kalk , LIME

    Similar titles

    OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET

    KAIJO AKIRA | European Patent Office | 2020

    Free access

    OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET

    KAIJO AKIRA | European Patent Office | 2020

    Free access

    OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET

    KAIJO AKIRA | European Patent Office | 2021

    Free access

    OXIDE SINTERED BODY AND SPUTTERING TARGET

    UTSUNO FUTOSHI / TERAI KOTA | European Patent Office | 2015

    Free access

    OXIDE SINTERED BODY AND SPUTTERING TARGET

    INOUE KAZUYOSHI / TOMAI SHIGEKAZU / SHIBATA MASATOSHI et al. | European Patent Office | 2019

    Free access
    Back to top