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    OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET

    New search for: KAIJO AKIRA

    The invention relates to an oxide sintered body (1) in which the average value of the Vickers Hardness values of the surface of the oxide sintered body (1) is 500 to 900 Hv exclusive.

    本发明涉及一种氧化物烧结体(1)，氧化物烧结体(1)的表面的维氏硬度的平均值超过500Hv、小于900Hv。

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    OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET

    New search for: KAIJO AKIRA

    The invention relates to an oxide sintered body (1) in which the average value of the Vickers Hardness values of the surface of the oxide sintered body (1) is 500 to 900 Hv exclusive.

    本发明涉及一种氧化物烧结体(1)，氧化物烧结体(1)的表面的维氏硬度的平均值超过500Hv、小于900Hv。

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    Download

    OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET

    New search for: KAIJO AKIRA

    The invention relates to an oxide sintered body (1) in which the average value of the Vickers Hardness values of the surface of the oxide sintered body (1) is 500 to 900 Hv exclusive.

    本发明涉及一种氧化物烧结体(1)，氧化物烧结体(1)的表面的维氏硬度的平均值超过500Hv、小于900Hv。

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    Title:

    OXIDE SINTERED BODY, SPUTTERING TARGET, AND METHOD FOR PRODUCING SPUTTERING TARGET

    Additional title:

    氧化物烧结体、溅射靶及溅射靶的制造方法

    Contributors:

    KAIJO AKIRA (author)

    Publication date:

    2021-09-21

    Type of media:

    Patent

    Type of material:

    Electronic Resource

    Language:

    Chinese

    Classification:

    IPC:  C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL / C04B Kalk , LIME

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