Local equilibrium phase diagrams: SiC deposition in a hot wall LPCVD reactor

Chiu, C. C. / Desu, S. B. / Chen, Z. J. et al. | British Library Online Contents | 1994

A model for low pressure chemical vapor deposition in a hot-wall tubular reactor

Houf, W. G. / Grcar, J. F. / Breiland, W. G. | British Library Online Contents | 1993

Deposition of epitaxial -SiC films on porous Si(100) from MTS in a hot wall LPCVD reactor

Chiu, C. C. / Desu, S. B. / Chen, G. et al. | British Library Online Contents | 1995

Investigation of the dosage effect on the activation of arsenic-and boron-implanted low-pressure chemical vapor deposition (LPCVD) amorphous-silicon films

Wang, F.-S. / Tsai, M.-J. / Lai, W.-K. et al. | British Library Online Contents | 1996

Determination of Percursor Conversion in a Multiwafer Hot-Wall Chemical Vapor Deposition (CVD) Reactor

Tesfaghiorghis, T. / Loney, N. W. | British Library Online Contents | 1995