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Interface dislocations forming during epitaxial growth of GeSi on (111) Si substrates at high temperatures
Interface dislocations forming during epitaxial growth of GeSi on (111) Si substrates at high temperatures
Interface dislocations forming during epitaxial growth of GeSi on (111) Si substrates at high temperatures
Ernst, F. (Autor:in) / Messerschmidt, U. / Heuer, A. H.
01.01.1997
13 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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