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A Monte Carlo simulation of silicon nitride thin film microstructure in ultraviolet localized-chemical vapor deposition
A Monte Carlo simulation of silicon nitride thin film microstructure in ultraviolet localized-chemical vapor deposition
A Monte Carlo simulation of silicon nitride thin film microstructure in ultraviolet localized-chemical vapor deposition
Flicstein, J. (Autor:in) / Pata, S. (Autor:in) / Le Solliec, J. M. (Autor:in) / Chun, L. S. H. K. (Autor:in) / Palmier, J. F. (Autor:in) / Courant, J. L. (Autor:in) / Dreysee, H. / Kawazoe, Y. / Wille, L. T. / Demangeat, C.
01.01.1998
11 pages
Aufsatz (Zeitschrift)
Englisch
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