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Hydrogen redistribution and enhanced thermal donor formation at post implantation annealing of p-type hydrogen implanted Czochralski silicon
Hydrogen redistribution and enhanced thermal donor formation at post implantation annealing of p-type hydrogen implanted Czochralski silicon
Hydrogen redistribution and enhanced thermal donor formation at post implantation annealing of p-type hydrogen implanted Czochralski silicon
Ulyashin, A. G. (Autor:in) / Ivanov, A. I. (Autor:in) / Khorunzhii, I. A. (Autor:in) / Job, R. (Autor:in) / Fahrner, W. R. (Autor:in) / Komarov, F. F. (Autor:in) / Kamyshan, A. C. (Autor:in) / Weber, J. / Mesli, A.
01.01.1999
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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