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Characterization of vacancy-type defects in Al^+ and N^+ co-implanted SiC by slow positron implantation spectroscopy
Characterization of vacancy-type defects in Al^+ and N^+ co-implanted SiC by slow positron implantation spectroscopy
Characterization of vacancy-type defects in Al^+ and N^+ co-implanted SiC by slow positron implantation spectroscopy
Anwand, W. (Autor:in) / Brauer, G. (Autor:in) / Coleman, P.G. (Autor:in) / Yankov, R. (Autor:in) / Skorupa, W. (Autor:in)
APPLIED SURFACE SCIENCE ; 149 ; 140-143
01.01.1999
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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