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Characterization of vacancy-type defects in Al^+ and N^+ co-implanted SiC by slow positron implantation spectroscopy
Characterization of vacancy-type defects in Al^+ and N^+ co-implanted SiC by slow positron implantation spectroscopy
Characterization of vacancy-type defects in Al^+ and N^+ co-implanted SiC by slow positron implantation spectroscopy
Anwand, W. (author) / Brauer, G. (author) / Coleman, P.G. (author) / Yankov, R. (author) / Skorupa, W. (author)
APPLIED SURFACE SCIENCE ; 149 ; 140-143
1999-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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