Damage annealing and dopant activation in Al ion implanted -SiC

Canut, B. / Ramos, S. / Roger, J.-A. et al. | British Library Online Contents | 1997

Atomistic modeling of dopant implantation and annealing in Si: damage evolution, dopant diffusion and activation

Pelaz, L. / Marqués, L. A. / Aboy, M. et al. | British Library Online Contents | 2005

Simulation of dopant diffusion and activation during flash lamp annealing

Zechner, C. / Matveev, D. / Zographos, N. et al. | British Library Online Contents | 2008

Effect of Dopant Concentrations and Annealing Conditions on the Electrically Active Profiles and Lattice Damage in Al Implanted 4H-SiC

Weng, M.H. / Roccaforte, F. / Giannazzo, F. et al. | British Library Online Contents | 2010

Crystalline Recovery after Activation Annealing of Al Implanted 4H-SiC

Hattori, R. / Watanabe, T. / Mitani, T. et al. | British Library Online Contents | 2009