Clustering of ultra-low-energy implanted boron in silicon during activation annealing

Schroer, E. / Privitera, V. / Priolo, F. et al. | British Library Online Contents | 2000

Atomic transport properties and electrical activation of ultra-low energy implanted boron in crystalline silicon

Privitera, V. / Napolitani, E. / Priolo, F. et al. | British Library Online Contents | 1999

Non-melt laser annealing of Plasma Implanted Boron for ultra shallow junctions in Silicon

Florakis, A. / Misra, N. / Grigoropoulos, C. et al. | British Library Online Contents | 2008

Annealing and activation of silicon implanted in semi-insulating InP substrates

Dong, H. W. / Zhao, Y. W. / Li, J. M. | British Library Online Contents | 2003

Loss of implanted heavy elements during annealing of ultra-shallow ion-implanted silicon: The complete picture

Chan, T. K. / Koh, S. Y. / Fang, V. et al. | British Library Online Contents | 2014