Characterization of polycrystalline silicon carbide films grown by atmospheric pressure chemical vapor deposition on polycrystalline silicon

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Zirconium nitride polycrystalline films grown on Si (111) substrates by metal organic chemical vapor deposition

Jin, J. / Ko, K. B. / Song, H. s. et al. | British Library Online Contents | 2014

Heteroepitaxy of 3C-SiC using triode plasma enhanced chemical vapor deposition on Si substrates without buffer layer

Yasui, K. / Kimura, M. / Sanada, K. et al. | British Library Online Contents | 1999

Large grain polycrystalline silicon via chemical vapor deposition

Beckloff, B. N. / Lackey, W. J. / Pickering, E. M. | British Library Online Contents | 1999

Carbon Nanowalls Grown by Microwave Plasma Enhanced Chemical Vapor Deposition

Wu, Y. / Qiao, P. / Chong, T. et al. | British Library Online Contents | 2002