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Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopy

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Controlled growth of gallium nitride single-crystal nanowires using a chemical vapor deposition method

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Deposition temperature dependence of electrical instability in an InP metal-insulator-semiconductor capacitor provided by plasma-enhanced chemical vapour deposited silicon nitride

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High-quality ultrathin chemical-vapor-deposited Ta2O5 capacitors prepared by high-density plasma annealing

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