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The influence of substrate temperature on the evolution of ion implantation-induced defects in epitaxial 6H-SiC
The influence of substrate temperature on the evolution of ion implantation-induced defects in epitaxial 6H-SiC
The influence of substrate temperature on the evolution of ion implantation-induced defects in epitaxial 6H-SiC
Anwand, W. (Autor:in) / Brauer, G. (Autor:in) / Wirth, H. (Autor:in) / Skorupa, W. (Autor:in) / Coleman, P. G. (Autor:in)
APPLIED SURFACE SCIENCE ; 194 ; 127-130
01.01.2002
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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