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    Characterization of As+ ion-implanted layers in strained-Si/SiGe/Si hetero-structures

    New search for: Ishida, T.
    New search for: Irieda, S.
    New search for: Inada, T.
    New search for: Sugii, N.

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    Characterization of As+ ion-implanted layers in strained-Si/SiGe/Si hetero-structures

    New search for: Ishida, T.
    New search for: Irieda, S.
    New search for: Inada, T.
    New search for: Sugii, N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Characterization of As+ ion-implanted layers in strained-Si/SiGe/Si hetero-structures

    New search for: Ishida, T.
    New search for: Irieda, S.
    New search for: Inada, T.
    New search for: Sugii, N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Characterization of As+ ion-implanted layers in strained-Si/SiGe/Si hetero-structures

    Contributors:

    Ishida, T. (author) / Irieda, S. (author) / Inada, T. (author) / Sugii, N. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 224 ; 82-86

    Publication date:

    2004-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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