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Fabrication of 50 nm high performance strained-SiGe pMOSFETs with selective epitaxial growth
Fabrication of 50 nm high performance strained-SiGe pMOSFETs with selective epitaxial growth
Fabrication of 50 nm high performance strained-SiGe pMOSFETs with selective epitaxial growth
Loo, R. (Autor:in) / Collaert, N. (Autor:in) / Verheyen, P. (Autor:in) / Caymax, M. (Autor:in) / Delhougne, R. (Autor:in) / Meyer, K. D. (Autor:in)
APPLIED SURFACE SCIENCE ; 224 ; 292-296
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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