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Fabrication of 50 nm high performance strained-SiGe pMOSFETs with selective epitaxial growth
Fabrication of 50 nm high performance strained-SiGe pMOSFETs with selective epitaxial growth
Fabrication of 50 nm high performance strained-SiGe pMOSFETs with selective epitaxial growth
Loo, R. (author) / Collaert, N. (author) / Verheyen, P. (author) / Caymax, M. (author) / Delhougne, R. (author) / Meyer, K. D. (author)
APPLIED SURFACE SCIENCE ; 224 ; 292-296
2004-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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