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Flat Surface after High-Temperature Annealing for Phosphorus-Ion Implanted 4H-SiC(0001) using Graphite Cap
Flat Surface after High-Temperature Annealing for Phosphorus-Ion Implanted 4H-SiC(0001) using Graphite Cap
Flat Surface after High-Temperature Annealing for Phosphorus-Ion Implanted 4H-SiC(0001) using Graphite Cap
Negoro, Y. (Autor:in) / Katsumoto, K. (Autor:in) / Kimoto, T. (Autor:in) / Matsunami, H. (Autor:in)
MATERIALS SCIENCE FORUM ; 457/460 ; 933-936
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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