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Homoepitaxial Growth of 4H-SiC on Trenched Substrates by Chemical Vapor Deposition
Homoepitaxial Growth of 4H-SiC on Trenched Substrates by Chemical Vapor Deposition
Homoepitaxial Growth of 4H-SiC on Trenched Substrates by Chemical Vapor Deposition
Chen, Y. (Autor:in) / Kimoto, T. (Autor:in) / Takeuchi, Y. (Autor:in) / Malhan, R. K. (Autor:in) / Matsunami, H. (Autor:in)
MATERIALS SCIENCE FORUM ; 457/460 ; 189-192
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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