Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
A study of dynamic SIMS analysis of low-k dielectric materials
A study of dynamic SIMS analysis of low-k dielectric materials
A study of dynamic SIMS analysis of low-k dielectric materials
Mowat, I. A. (Autor:in) / Lin, X. F. (Autor:in) / Fister, T. (Autor:in) / Kendall, M. (Autor:in) / Chao, G. (Autor:in) / Yang, M. H. (Autor:in)
APPLIED SURFACE SCIENCE ; 252 ; 7182-7185
01.01.2006
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
SIMS depth profiling of advanced gate dielectric materials
British Library Online Contents | 2003
|British Library Online Contents | 2003
|SIMS study of Cu trapping and migration in low-k dielectric films
British Library Online Contents | 2004
|Characterization of HfO2 dielectric films with low energy SIMS
British Library Online Contents | 2006
|Characterization of high-k gate dielectric films using SIMS
British Library Online Contents | 2003
|