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Computational methods for the simulation of the excimer laser annealing in MOS technology
Computational methods for the simulation of the excimer laser annealing in MOS technology
Computational methods for the simulation of the excimer laser annealing in MOS technology
Magna, A. L. (Autor:in) / Alippi, P. (Autor:in) / Mannino, G. (Autor:in) / Privitera, V. (Autor:in) / Fortunato, G. (Autor:in) / Mariucci, L. (Autor:in) / Camalleri, M. (Autor:in) / Monakhov, E. (Autor:in) / Svensson, B. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 114/115 ; 100-104
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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