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X-ray photoelectron spectroscopic analysis of HfO2/Hf/SiO2/Si structure
X-ray photoelectron spectroscopic analysis of HfO2/Hf/SiO2/Si structure
X-ray photoelectron spectroscopic analysis of HfO2/Hf/SiO2/Si structure
Tan, R. (Autor:in) / Azuma, Y. (Autor:in) / Kojima, I. (Autor:in)
APPLIED SURFACE SCIENCE ; 241 ; 135-140
01.01.2005
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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