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Forward-Bias Degradation in 4H-SiC p^+nn^+ Diodes: Influence of the Mesa Etching
Forward-Bias Degradation in 4H-SiC p^+nn^+ Diodes: Influence of the Mesa Etching
Forward-Bias Degradation in 4H-SiC p^+nn^+ Diodes: Influence of the Mesa Etching
Camara, N. (Autor:in) / Thuaire, A. (Autor:in) / Bano, E. (Autor:in) / Zekentes, K. (Autor:in) / Nipoti, R. / Poggi, A. / Scorzoni, A.
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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British Library Online Contents | 2004
|Impact of RIE Etching on the Breakdown Voltage of 4H-SiC Mesa Diodes
British Library Online Contents | 2009
|The Role of Carrier Lifetime in Forward Bias Degradation of 4H-SiC PiN Diodes
British Library Online Contents | 2004
|Investigation of Epitaxial SiC PiN Diodes with Variable Mesa Height
British Library Online Contents | 2011
|Absence of Dislocation Motion in 3C-SiC pn Diodes under Forward Bias
British Library Online Contents | 2007
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