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Field Effect Mobility in n-Channel Si Face 4H-SiC MOSFET with Gate Oxide Grown on Aluminum Ion-Implanted Material
Field Effect Mobility in n-Channel Si Face 4H-SiC MOSFET with Gate Oxide Grown on Aluminum Ion-Implanted Material
Field Effect Mobility in n-Channel Si Face 4H-SiC MOSFET with Gate Oxide Grown on Aluminum Ion-Implanted Material
Gudjonsson, G. (Autor:in) / Olafsson, H. O. (Autor:in) / Allerstam, F. (Autor:in) / Nilsson, P. A. (Autor:in) / Sveinbjornsson, E. O. (Autor:in) / Rodle, T. (Autor:in) / Jos, R. (Autor:in) / Nipoti, R. / Poggi, A. / Scorzoni, A.
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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