Silicon surface passivation using thin HfO2 films by atomic layer deposition

Gope, J. / Batra, N. / Panigrahi, J. et al. | British Library Online Contents | 2015

Micro-Raman spectroscopy and X-ray diffraction studies of atomic-layer-deposited ZrO2 and HfO2 thin films

Tkachev, S. N. / Manghnani, M. H. / Niilisk, A. et al. | British Library Online Contents | 2005

Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

Rammula, R. / Aarik, J. / Mandar, H. et al. | British Library Online Contents | 2010

Transmission electron microscopy studies of HfO2 thin films grown by chloride-based atomic layer deposition

Mitchell, D. R. / Aidla, A. / Aarik, J. | British Library Online Contents | 2006

Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates

Kukli, K. / Ritala, M. / Pilvi, T. et al. | British Library Online Contents | 2005