Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Effect of filament temperature on HWCVD deposited a-SiC:H
Effect of filament temperature on HWCVD deposited a-SiC:H
Effect of filament temperature on HWCVD deposited a-SiC:H
Swain, B. P. (Autor:in) / Dusane, R. O. (Autor:in)
MATERIALS LETTERS ; 60 ; 2915-2919
01.01.2006
5 pages
Aufsatz (Zeitschrift)
Englisch
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Effect of substrate temperature on HWCVD deposited a-SiC:H film
British Library Online Contents | 2007
|SAXS analysis of the effect of H2 dilution on microstructural changes of HWCVD deposited a-SiC:H
British Library Online Contents | 2006
|British Library Online Contents | 2007
|British Library Online Contents | 2008
|Wet-Etching Characteristics of SiCN Films Deposited by HWCVD Method
British Library Conference Proceedings | 2013
|