Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
The analysis of structural and electronic environments of silicon network in HWCVD deposited a-SiC:H films
The analysis of structural and electronic environments of silicon network in HWCVD deposited a-SiC:H films
The analysis of structural and electronic environments of silicon network in HWCVD deposited a-SiC:H films
Swain, B. P. (Autor:in)
APPLIED SURFACE SCIENCE ; 253 ; 8695-8698
01.01.2007
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Effect of filament temperature on HWCVD deposited a-SiC:H
British Library Online Contents | 2006
|Effect of substrate temperature on HWCVD deposited a-SiC:H film
British Library Online Contents | 2007
|SAXS analysis of the effect of H2 dilution on microstructural changes of HWCVD deposited a-SiC:H
British Library Online Contents | 2006
|British Library Online Contents | 2008
|Wet-Etching Characteristics of SiCN Films Deposited by HWCVD Method
British Library Conference Proceedings | 2013
|